News & Event

PHI China / CoreTech Integrated Limited was being invited to participate in the CHInano and gave a talk in the workshop held by WinTech Nano (Suzhou) Limited. As the theme of the workshop, Analysis Testing Application, our executive director Mr. Wensly Yip had given a talk on the topic of “Commercialize XPS instrument combining both Soft and Hard Focus X-ray Source”. Such system, as model name PHI Quantes, utilize a dual monochromator for producing the 2 types of the scanning X-ray including Al K-Alpha X-ray and Cr K-Alpha X-ray. Both types of X-ray are in tens micron of spatial resolution with imaging capabilities. When these two X-ray combines into one system, it immediately gives to researcher a flexible way for detection depth. This eliminates the problem for many analysis that the samples putting in for analysis had already have too thick of the surface contamination which in a result no useful data can be produced.   PHI China / CoreTech Integrated Limited is the sole representative for ULVAC-PHI in China and had been in this position since 2009. We have always been continuously trying our best to promote the best surface analysis instrument from ULVAC-PHI and provide the best after-sale services to all the surface analysis instrument users.   Dinner banquet at the CHInano

PHI China / CoreTech Integrated Limited would like to congratulate the successfully held of the SIMS China conference, which host by SINANO and took place at the city of Suzhou, China in 2018 October. SIMS China is an event organized every 2 years. It was originally started by Prof. Jia Liang Zhen, our well-known SIMS mentor from Tsinghua University.   In this year SIMS China conference, ULVAC-PHI Mr. Nobuaki Urushihara, Mr. Takuji Shibasaki, Dr. Hsunyun Chang and Dr. Shinichi Iida together with PHI-USA Dr. Ashley Ellsworth had joint into the event. From PHI China / CoreTech Integrated Limited, executive director Mr. Wensly Yip, Ms. May Ling, Mr. William Zhang and Mr. Riky Zhu had joint the event. Dr. Ashley Ellsworth from PHI-USA had given a very interesting talk on “Using TOF-SIMS Tandem MS Imaging to Characterize Organic and Inorganic Materials: Two Case Studies” with one of the case example talked about an Amazonian damselfly wing. On combining a newly developed tandem mass technology, it brings to Tof-SIMS another breakthrough in the biological field once again.   Over the years, SIMS had become a very powerful analysis technique in the world which provide very useful information to the researchers. In China, SIMS society had also grown into one of the biggest group in the world. A record high number of participates had joint to the International SIMS conference in Poland in year 2017. We believe that SIMS technology will continue to play more important role for China market while also China will become one of the most important market for SIMS too.   PHI China / CoreTech Integrated Limited is the only Surface Analysis instruments manufacturer in the world who made a full series of products including XPS, AES, Tof-SIMS and Dynamic-SIMS, had been a regular sponsor for this event.   Group photo during SIMS China, Suzhou.   Dr. Ashley Ellsworth provided a talk showing the strength of tandem MS on Tof-SIMS   From left to right: Dr. Shinichi Iida, Mr. Nobuaki Urushihara, Dr. Ashley Ellsworth, Mr. Takuji Shibasaki, Dr. Hsunyun Chang, Mr. Wensly Yip, Mr. William Zhang Photo taken at Suzhou, China during the SIMS conference

In 2018-9, USTC had successfully organized the International Workshop of Synchrotron Radiation Spectroscopies for Energy Related Materials. Closed to 100 participants were joint from different countries in the world. USTC is very popular organization with one of the very few Synchrotron Radiation facilities in the world. Over the years, USTC Synchrotron Radiation lab had helped in the various research field with a lot of valuable contribution.   In this event, PHI China / CoreTech Integrated Limited had been invited to join as one of the sponsor company. We have also been given a chance that for our executive director Mr. Wensly Yip to present the newest Hard X-ray Photo-electron Spectroscopy instrument, named PHI Quantes, during the workshop.   The PHI Quantes, which utilize a Cr hard X-ray at an X-ray energy of 5414.9eV, is able to provide 3 times deeper information than the more common commercial XPS instrument which usually uses the Al K-Alpha X-ray (energy 1486.6eV). Other than that, PHI Quantes provided Cr hard X-ray is capable to be focus down to tens of micron range while also able to scan over a selected area. This provides some very interesting idea into the XPS analysis for our future technologies development.   PHI China / CoreTech Integrated Limited would like to congratulate to USTC and Professor Zhu JunFa for the very successful workshop, and wish we will have more and more opportunities to work with USTC in the future.     Group photo taken at USTC workshop

CMRS (China Material Research Society) exhibition had held in 2018-7 in the beautiful city of Xiamen, China. During the exhibition, hundreds of company participated in the exhibition booth to show their newest technologies in applications of different materials.   PHI China / CoreTech Integrated Limited had joint into the event as one of the supplier, in representing Surface Analysis technologies field. There was also a poster section in this exhibition, and surprisingly there are over 40 posters had utilized some part of surface analysis techniques such as XPS (X-ray Photo-electron Spectroscopy) or AES (Auger Electron Spectroscopy) to characterize some materials property hence in-help for research or product development purposes.   In this year, it has already been the 4th consecutive year that for PHI China to participate in this event. Our executive director, Mr. Wensly Yip, had a chance to present a talk during this time exhibition on the topic of “New material characterization method by Tandem Tof-SIMS analysis” which is another important technique in surface analysis field. Mr. Wensly Yip had explained how the tandem MS approach had given a completely different concept for the Tof-SIMS analysis. In ordinary Tof-SIMS, it already has the advantages such as being able to detect Hydrogen, very high detection limit until the ppm to ppb level, very fast parallel detection and also the sub-micron spatial resolution capabilities. Then the new tandem MS function added had dramatically help Tof-SIMS to be able to distinguish peaks in the high mass range (>200amu) with complete confidence.   PHI China / CoreTech Integrated Limited will always have the full dedication into the China market and target to provide the best surface analysis instrument and the after-sale service to all the users. We hope CMRS will continue its success while we would be proud to keep being part of the exhibition in every year.   Mr. Wensly Yip taken a photo at the CMRS exhibition at Xiamen   Discussion after the presentation with answering questions by Mr. Wensly Yip   Mr. Wensly Yip presented the topic “New material characterization method by Tandem Tof-SIMS analysis

The second Shenzhen Tsinghua University Seminar was successfully held in the Lecture Hall of Shenzhen Tsinghua University Graduate School from 22nd to 23rd March this year. This seminar is mainly organized by the Graduate School of Shenzhen Tsinghua University and co-organized by ULVAC-PHI and PHI (China) Limited. There were around 200 participants who have joined the Open house. The participants were not only from the teachers and students of Tsinghua University Graduate School, but also some surface analysis experts from other districts in China.   The seminar format was the same with last year. Shenzhen Tsinghua University Seminar was like a combination of ‘Seminar’ and ‘Training’. In the seminar part, Scientist of ULVAC-PHI Dr. Chang Hsunyun, Specialist of ULVAC-PHI, Mr. Urushihara Nobuaki and Professor Shue from Taiwan Academia Sinica were the guests to present the latest techniques and applications of surface analysis in order to let the participants to have deeper understandings on the information and applicable areas of surface analysis instruments. For the training part, Executive Director of PHI (China) Mr. Wensly Yip was another guest to have a sharing on the data analysis of new technique on MSMS Tof. He also talked about new surface analysis technique and applications. Besides, Professor Zhang and Mr. Yip have provided technical consultations to all the participants. Both of them have explained and presented the functions and characteristics of XPS and MSMS to the experts and professors. They answered their questions one by one and enhanced the understandings in XPS and MSMS in terms of the wide range of possible applications.   Registration area at the seminar   Executive Director of PHI (China) Mr. Wensly Yip had given a talk to the audiences   Group photo  

ULVAC-PHI surface analysis users meeting was successfully held in Shantou University on 10th August, 2017. There were a lot of participants such as professors, experts and students who have joined the user meeting.   Before the conference started, Executive Director of PHI (China) Mr. Wensly Yip has given a speech to welcome all our users to be gathered again at the same time every year. This is a great platform for all users to discuss the development and the latest application of XPS. After that, comprehensive presentations about XPS powder microanalysis have been made. All users were satisfied with the presentations’ results. Apart from that, Professor Shyue from Taiwan Academia Sinica has given a speech on Ion gun co-sputtering XPS Applications X. That was a great presentation and academic investigation.   One of the guests, ULVAC-PHI Asia Marketing Manager Mr. Takuji Shibasaki has given a presentation on how to use ULVAC-PHI Ellipsometer in a better way. He had made a very comprehensive introduction and description on this topic. Another guest, ULVAC-PHI scientist Dr. Zhang has given a presentation on Tof-SIMS latest application of materials and done a very comprehensive elaboration on this topic. She even shared some data processing skills of XPS and AES. The guests discussed a lot with all our users in the conference.   Thank you for all the support and participation from the guests and participants. We hope to build up a strong network and platform to gather all the users. It could be a great opportunity for them to share their analysis techniques and have better communication. It is good for us to have a better result in the field of science and technology.   Executive Director of PHI (China) Mr. Wensly Yip had given a talk to the audiences   ULVAC-PHI Asia Marketing Manager Mr. Takuji Shibasaki had given a talk to the audiences   Scientist of ULVAC-PHI Dr. Chang Hsunyun had given a talk to the audiences

(This page is in Chinese only.  For details, please kindly contact our representative.)   致各位老师、专家和单位人员：   首先，诚挚地感谢各位一直以来对PHI的信任与支持！正是得益于来自各方的提携和帮助，PHI中国的业务才得以不断发展与壮大。一路走来，感谢有您！   PHI 在中国的业务发展过程中一直秉承着“让中国用户享受到全球一流的表面分析技术专业服务”这一理念。PHI不仅为中国用户带来了世界一流的产品和技术，更持续致力于促进用户间技术交流与提升，分享推广最佳实践成果，优化解决方案，从而使得PHI表面分析产品的用户不仅在售后服务上免除了后顾之忧，更能享受到一流的应用技术支持、培训交流、行业互动等增值服务。由PHI发起的表面分析应用与技术用户会议正是PHI全力打造的这样一个交流平台。   继2016年成功重新举办用户会议以来，该会议得到了与会各方的好评，取得了良好的用户反馈。在此，我们诚邀PHI的各位新老客户莅临高德公司和ULVAC-PHI公司在汕头共同举办的“ULVAC-PHI 表面分析应用与技术用户会议”（2017年8月10日，中国汕头大学）。本次会议将继续为原厂、用户和学校及科研机构搭建技术交流和共享平台。   现就本次会议的相关安排通知如下：   一、会议形式及内容 • 仪器使用和数据处理培训班 • ULVAC-PHI 表面分析技术最新发展和应用   二、重要时间、地点和会议安排   2017年8月09日 - 全天报到 报到地点: 汕头大学学术交流服务中心 (ACC)   2017年8月10日   ULVAC-PHI 表面分析应用与技术用户会议 2016年8月10日 - 9:00am – 9:15am  -  会议开幕致辞  9:15am – 9:45am  -  PHI XPS粉末微区分析表侦上的突破  9:45am – 10:15am  -  IPES 反光电子能谱和UPS联用的应用  10:15am – 10:40am  -  茶歇  10:40am – 11:10am  -  ULVAC-PHI Ellipsometer 椭偏仪  11:10am – 11:40am   -  Tof-SIMS 最新材料应用  11:40am – 12:00pm  -  ULVAC-PHI 仪器多种联用  12:00pm – 13:30pm  -  午餐时间  13:30pm – 15:00pm  -  XPS和AES数据处理技巧  15:00pm – 17:30pm  -  用户讨论时间           18:30pm          -  晚宴   三、会议收费 和 住宿安排 会议参会免费,并招待用餐。住宿建议安排于汕头大学学术交流服务中心(ACC)或汕头大学专家公寓, 住宿费用自理。如需帮忙订房,请与我们联系。          (1) 汕头大学学术交流服务中心(ACC)        Administrative Department, Shantou University Academic Conference Centre        标准间（双床）：441元(不含早)         标准间（大床）：441元(不含早)         豪华大床房：476元（不含早）        联系电话Tel：0754-82905103        邮箱Email：stuacc@stu.edu.cn        地址Add：中国广东省汕头市大学路243号          (2) 汕头大学专家公寓        双人间：160元（不含早）        联系电话Tel：0754-86503146        邮箱Email：zjgy1@stu.edu.cn   五、联系方式                                联系人：凌媚（手机 186 1249 8200，邮箱 may.ling@coretechint.com） 潘剑南（手机 186 1230 078，邮箱 nice.pan@coretechint.com)林文俊（邮箱 michael.lam@coretechint.com) 公司电话：010-62519668 公司传真：010-62513509   欢迎各位老师、专家和单位人员，报名参会。 附件一：《高德公司 邀请函》附件二：《报名表》 请将填妥报名报发送至michael.lam@coretechint.com。   2017年8月11~13日 将为在汕头大学汕头检验检测学会承办的2017全国表面分析科学与技术应用学术会议。ULVAC-PHI和高德公司将继续全程参与，也诚邀各位老师和专家们一同共襄盛举。   高德英特（北京）科技有限公司 ULVAC-PHI Incorporated

(This page is in Chinese only.  For details, please kindly contact our representative.)   “2017年5月18日，由清华大学材料中心主办、ULVAC-PHI与PHI （China）高德英特公司共同协办的“表面分析技术俄歇电子能谱仪应用研讨会暨培训班”在清华大学成功举办。此次活动吸引了来自清华大学的师生及国内各高校相关专业的多位老师与专家。   此次培训班以研讨会与培训+实验室参观演示的模式进行。 在研讨会上，ULVAC-PHI原厂科学家张熏匀博士作为特邀嘉宾，为参会人员介绍了俄歇电子能谱仪（AES）的原理及应用范围；来自PHI（China）的执行总监叶上远先生则为参会人员介绍了扫描俄歇纳米探针（PHI710）的功能及特点，让参会者更深刻地了解在材料分析研究中如何最有效的利用俄歇电子能谱仪（PHI710）实现材料分析测试；此外，EBSD公司也在会上介绍了EBSD应用。   “PHI（China）的执行总监叶上远先生在下午的培训课中进行了MultiPak的演示，并就参会者提出的相关问题进行了一一解答。 提问答疑结束后，作为此次活动的收官环节，PHI（China）的主任工程师辛国强先生带领参会者参观了清华大学材料学院实验室的扫描俄歇纳米探针（PHI710）并进行了现场演示实验。   作为中国表面分析市场的领军企业，PHI在中国区业务拓展过程中一直在不断探索如何让中国用户享受到全球一流的表面分析技术专业服务。从用户角度出发，切实加强售后服务和用户体验，正是PHI一直秉持的理念。在这一理念的引导下，PHI不断加大售后及运营管理方面的投入，此次活动即是PHI践行该理念的系列举措之一。PHI旨在通过这样的活动和投入，使得购买PHI产品的用户不仅在售后服务上免除了后顾之忧，更能够享受到一流的技术支持、培训交流、行业互动等产品以外的增值服务。PHI将继续致力于促进用户间技术交流与提升，分享推广最佳实践成果，优化解决方案，为中国表面分析行业的发展竭诚尽智！   2017年5月18日，清华大学材料中心会议室，由陶琨老师做简短的会议致辞。   叶上远（Wensly.Yip）总监致辞   EDAX中国公司应用专家严琴舫介绍EBSD的功能和应用   ULVAC-PHI 亚洲区销售经理 Mr. Takuji Shibasaki 柴崎琢自 致词   叶上远（Wensly.Yip）在做MultiPak的演示   辛国强（PHI-China主任工程师）带领与会者实验室参观、演示PHI710

The 14th China International Scientific Instruments and Laboratory Equipment Exhibition (ESEE) was successfully held in Nanjing International Exhibition Center from 14th April to 16th April this year.   PHI (China) had joined the conference to display and introduce the instruments such as TOF-SIMS, AES and XPS. It successfully aroused the audiences’ interests and awareness. The technicians from PHI (China) have explained the functions and characteristics of the instruments to the audiences such as instruments users, teachers and experts one by one. It could clean up their confusion and let them to have better understandings on the instruments. This was a golden chance for us to have a better understanding on customer’s needs.   Exhibition venue of ESEE   PHI (China) sets up a booth at the exhibition    Executive Director of PHI (China) Mr. Wensly Yip explained the functions and characteristics of the instruments

China International Scientific Instrument and Laboratory Equipment Exhibition (CISILE) was successfully held in China National Convention Center from 6th April to 8th April this year.   CISILE 2017 has not only attracted the international enterprises from more than 20 countries and regions, but also some teachers and students from the local universities to join the exhibition. PHI (China) had joined the conference to display and introduce the instruments such as TOF-SIMS, AES and XPS. It successfully aroused the audiences’ interests and awareness. The technicians from PHI (China) have explained the functions and characteristics of the instruments to the audiences one by one. It could clean up the audiences’ confusion and let them to have better understandings on the instruments. This made an excellent atmosphere with good display, communication and interaction.   This is a golden opportunity to let PHI (China) to be one of the exhibitors this year. This international conference is a great learning platform for us to communicate and interact with different experts, professors and students. PHI (China) was so glad to present the latest instruments and raise the awareness from the public. This was successfully to let more audiences to know about wide range of application of TOF-SIMS, AES and XPS.   Exhibition venue of CISILE   PHI (China) sets up a booth at the exhibition   Technicians explained the functions and characteristics of the instruments