The PHI ADEPT 2 is the next-generation quadrupole-based Dynamic Secondary Ion Mass Spectrometry (D-SIMS) instrument, building on the legacy of the ADEPT-1010. It delivers higher sensitivity, ultimate depth resolution, and fully automated operation - designed for advanced semiconductor and thin film analysis.
Key features:
- High speed and high sensitivity SIMS: Optimized secondary ion collection optics for rapid, sensitive depth profiling
- Ultimate depth resolution: High-density low-energy ion beam (down to 250 eV) greatly improves depth resolution for ultra-thin films (<5 nm)
- Easy automated analysis: Simple GUI software interface enables fast setup of multi-point analysis with unattended operation
- Stable measurement using ICP ion source: Optional ICP ion source provides the highest brightness O₂⁺ beam available - achieving a beam spot size of less than 0.5 μm
