The PHI GENESIS represents a new standard in surface analysis, offering unprecedented automation, multi-technique capabilities, and high-performance XPS and HAXPES analysis.
Key features:
- Ease of operation: Set up routine and advanced multi-technique acquisitions easily, all within one intuitive screen.
- Multi-Technique options: Wide range of options that can meet all surface analysis needs.
- Precise location analysis: Navigate with confidence using sub-5μm X-ray-induced SXI images.
- High – Throughput analysis: Fully Automated Parking positions and sample holders up to 80x80mm.
- Depth Profiling: High-speed, non-destructive depth profiling with multiple ion guns converging on a single point.
- Confocal dual scanning X-ray source: XPS and HAXPES analysis from the same spot.
- Dual-beam charge neutralization: Enables XPS and AES analysis on insulating samples.
